Ph. D (Engineering) (1998, Nagoya Institute of Technology ) “Study on MOCVD growth of GaN on Sapphire Substrates”.
Prof. Masayoshi UMENO’s group @Nagoya Institute of Technology
Research Associate (April 1998 - March 2004).
Assistant Professor (April 2004 - March 2005).
Associate Professor (April 2005 - 2009)
@Shibaura Institute of Technology
Associate Professor (April 2009 - 2013)
Professor (April 2013 - Present)
There is a growing demand to achieve compatibility between conservation of the global environment and safe, sanitary and comfortable living environment. We are focusing on research to contribute to a low-carbon society from the view point of semiconductor materials and devices.
-Current research topics
- CuxO, NiO and ZnO thin films for photovoltaics_x000B_ (MOCVD, and Sputtering techniques)
- Amorphous carbon thin films for photovoltaics_x000B_ (Sputtering, and CVD techniques)
- Fabrication of AlGaN/GaN HEMTs for microwave power transfer system
CuxO, NiO, ZnO, GaN, MOCVD, amorphous carbon
International / Domestic Societies
Hiroyasu ISHIKAWA is a member of the Japan Society of Applied Physics, the Laser Society of Japan, the Institute of Electronics, Information and Communication Engineers, and the Institute of Electrical Engineers of Japan.